Ashing
Depending on context, this may refer to plasma ashing, which is used in semiconductor manufacturing and Microelectromechanical systems for removing photoresist, or it may refer to the process below:
A test to deduce the amount of ash forming material present in a petroleum product so as to decide its use in certain applications. Ash-forming materials are considered to be undesirable impurities or contaminants.
The specimen is placed in a suitable vessel, evaporating dish or crucible and ignited. It is allowed to burn until only ash and carbon remains. The carbonaceous residue is reduced to ash by heating in a muffle Furnace at about 775oC, cooled and weighed.
Ashing is also performed prior to chemical analysis by Inductively Coupled Plasma Emission Spectrometry ICPES.
See also
- Ash (analytical chemistry)
- Inductively Coupled Plasma Emission Spectrometry
- Atomic absorption spectroscopy
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