| Trichlorosilane | |
|---|---|
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| IUPAC name |
trichlorosilane
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| Other names | silyl trichloride, silicochloroform |
| Identifiers | |
| CAS number | 10025-78-2  |
| EC number | 233-042-5 |
| UN number | 1295 |
| RTECS number | VV5950000 |
| SMILES |
[H][Si](Cl)(Cl)Cl
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| Properties | |
| Molecular formula | HCl3Si |
| Molar mass | 135.45 g·mol-1 |
| Appearance | colourless liquid |
| Density | 1.342×103 kg/m3 |
| Melting point |
−126.6 °C |
| Boiling point |
31.8 °C |
| Solubility in water | hydrolysis |
| Hazards | |
| MSDS | ICSC 0591 |
| EU Index | 014-001-00-9 |
| EU classification | Highly flammable (F+) Harmful (Xn) Corrosive (C) |
| R-phrases | R12, R14, R17, R20/22, R29, R35 |
| S-phrases | (S2), S7/9, S16, S26, S36/37/39, S42, S45 |
| NFPA 704 |
 4
3
2
|
| Flash point | −27 °C |
| Autoignition temperature |
185 °C |
| Explosive limits | 1.2–90.5% |
| Related compounds | |
| Related chlorosilanes | Chlorosilane Dichlorosilane Silicon tetrachloride |
| Related compounds | Trifluorosilane Tribromosilane Chloroform |
| (what is this?) (verify) Except where noted otherwise, data are given for materials in their standard state (at 25 °C, 100 kPa) |
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| Infobox references | |
Trichlorosilane is a chemical compound containing silicon, hydrogen, and chlorine. At high temperatures, it decomposes to produce silicon, and therefore purified trichlorosilane is the principal source of ultrapure silicon in the semiconductor industry. In water, it rapidly decomposes to produce a silicone polymer while giving off hydrochloric acid. Because of its reactivity and wide availability, it is frequently used in the synthesis of silicon-containing organic compounds.
Contents |
Production
Industrially, trichlorosilane is produced by blowing hydrogen chloride through a bed of silicon powder at 300°C. There, they combine to make trichlorosilane and hydrogen according to the chemical equation
- Si + 3 HCl → HSiCl3 + H2
A properly designed reactor can achieve a yield of 80-90% trichlorosilane. The major byproducts are silicon tetrachloride (chemical formula SiCl4), hexachlorodisilane (Si2Cl6), and dichlorosilane (H2SiCl2), from which trichlorosilane can be separated by distillation.
The reverse process is used in the production of silicon of higher purity.
Application
Trichlorosilane is the basic ingredient used in the production of purified polysilicons.
References
External links
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