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DT etching, short for Deep Trench etching, is a process used in semiconductor manufacturing to create deep and narrow trenches in silicon substrates. This process involves using a combination of chemical etching and mask patterning techniques to etch precise patterns on the silicon substrate for various applications in microelectronics and MEMS (Microelectromechanical Systems) devices. The depth and width of the trenches can be controlled precisely, making DT etching a critical process in creating high-performance semiconductor devices.

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1y ago

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