These boiling points are:
* CF4: -127,8 0C
* CHF3: -82,1 0C
CH2F2 has hydrogen bonds between molecules. So it has a higher melting point.
CH2F2 has a higher melting point (-136 oC).
CH2F2 because it contains Hydrogen
Yes it is and it has a tetrahedral shape
2ch4+6f2 --- 6hf+2chf3
7 potassium nitride. 8. iron (III) sulphide _. 9. gold (III) bromide . 10. zinc oxide ... hexa = 6, hepta = 7, octo = 8, nona = 9, deca = 10. Â.
CH3F - monofluoro methane or fluoro methane CH2F2 - difluoro methane CHF3 - trifluoroo methane CF4 - tetrafluoro methane
Even though F is more electronegative, CH3Cl has greater dipole moment because the bond length in this case is far longer than that in the case of CH3F since F is highly electronegative and it attracts the electron pair very strongly. Dipole moment is not just about charge, it is the product of charge and the bond length.
The shape of PF3 is trigonal bipyramidal. The geometric diagram determines this shape. Its electron domain geometry and molecular geometry are also the same.
Hydrocarbons containing chlorine atoms are called chlorinated hydrocarbons. Hydrocarbons containing fluorine atoms are called fluorinated hydrocarbons. eg> CHCl3, CHF3 etc
So the idea behind determining which compound is more acidic is linked to the stability of the conjugate bases. The more stable the conjugate base, the easier it is for the compound to lose a proton, the more acidic the compound. Comparing the two conjugate bases, CF3- and CCl3-. The negative charge on CF3- is stabilised by the induction effect of the electronegative fluorine while the negative charge on CCl3- is stabilised by both induction effects of chlorine and by delocalisation. This delocation can happen in CCl3- because the filled 2p orbitals of C can overlap with the empty 3d orbitals of Cl which lowers the energy. Some people call this backbonding. However F does not have empty d orbitals and this overlap cannot occur. Therefore, although the induction effect of F is stronger, the combination of induction and back bonding effect better stabilises the conjugate base in CHCl3, making it a stronger acid.
....F ....| H-C-F ....| ....F (Where each F atom has 6 dots around it showing the 3 pairs of non bonding electrons in its outer shell)
RF Generators are used in the Semiconductor industry. Typically on dry etch machines. A vacuum chamber has gas introduced, the pressure is controlled then the RF generator introduces RF power at 13.56Mhz into the chamber. Typical gasses are CL2, HBR, C2F6, SF6, O2, He, CHF3 and so on. Pressure are between 200mt - 2000mt typically. The resulting plasma etches the surface layers of a silicon wafer as part of the wafer process.
CHF3 is a polar molecule. The fluorine atoms are electronegative and draw electrons towards their end of the molecule, leaving the hydrogen with a slight positive charge on it. So dipole-dipole forces will act between the molecules. The molecules will also exert dispersion forces on each other, but these are much weaker than the dipole-dipole forces.
Strong polar attractions between molecules involving H, F, O, and N ~APEX