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RF Generators are used in the Semiconductor industry. Typically on dry etch machines. A vacuum chamber has gas introduced, the pressure is controlled then the RF generator introduces RF power at 13.56Mhz into the chamber. Typical gasses are CL2, HBR, C2F6, SF6, O2, He, CHF3 and so on. Pressure are between 200mt - 2000mt typically. The resulting plasma etches the surface layers of a silicon wafer as part of the wafer process.

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