npn is preferred to pnp since n-doping can be pushed to higher values without damaging silicon lattice. due to this fact, doped regions can be less resistive.
difference between npn and pnp is becoming smaller and smaller, tho.
oil
Metallization is a technique used to form metal contacts and interconnects in the fabrication of ICs.
Lithography is a technique used to make patterns on semiconductor materials.
Yes, dry oxidation technique is commonly used for forming field oxide in semiconductor device fabrication. It involves exposing a silicon wafer to oxygen at high temperatures, leading to the growth of a thin silicon dioxide layer that serves as an insulating field oxide. This technique is preferred for its controlled and uniform oxide growth.
For a transistor to be in active region : Base Emitter junction should be forward biased and Emitter collector junction should be reverse biased.
The 2 thumb-encircling hands technique.
Mass production and fabrication
laparoscopy or laparotomy procedures are currently the preferred technique
That would depend on your application. If there was a singke best way, that would be the only method used.
There is no one technique, as there is no one landmine. Rather than attempting to dismantle them, the preferred technique is to destroy them where they are found. This may be done with an explosive charge, or an incendiary device that burns and melts the explosives.
In the case of colpotomy used for tubal ligation procedures, laparoscopy or laparotomy procedures are currently the preferred technique
it is an electric device consisting of miniaturised transistor on a single semiconductor integrated circuit (IC) with a CPU a memory and input output ports it can be fascinated using VITS technique .