Phosphorus.
(And Boron for p-type)
what is semiconductor state advantages of semiconductor devices over electronic tubes
The types of dopant used are: p-type, n-type, p-type respectively.
Doping a semiconductor provides additional charge carriers to the material. The dopant atoms are easily ionized, and this provides the semiconductor with either free electrons in the conduction band or electron vacancies (or holes) in the valence band, both of which allow the semiconductor to conduct electricity.
Intrinsic semiconductors have small conductivity at the room temperature. and also if we raise the temperature to increase their conductivity then they will start acting merely like a conductor. and there will not be any control over the directions or the magnitude of the current flowing through it. so by mixing the suitable impurity(dopant) we obtain the extrinsic semiconductor. so that the conductivity as well as the control over the current can be increased. Although intrinsic semiconductor are also somwhere used in electronics where i high resistance layers or a separation layers b/t two systems is needed. like in PIN diode.
Dopants are elements added in very tiny quantities to semiconductors as impurities that modify the electrical characteristics of the semiconductor. They fall into two types, depending on the type of current carrier they introduce into the semiconductor: p-type and n-type.The p-type dopant elements are: boron, aluminum, gallium, and indium; because they have only 3 valence electrons (not the 4 that elemental semiconductors do) they leave voids in the valence band that can act as mobile current carriers called "holes", as these "holes" act as moving positive charges a semiconductor so doped is called p-type semiconductor. The n-type dopant elements are: nitrogen, phosphorus, arsenic, and antimony; because they have 5 valence electrons (not the 4 that elemental semiconductors do) they create extra electrons in the conduction band that are mobile current carriers, as these electrons are moving negative charges a semiconductor so doped is called n-type semiconductor.Note: neither p-type semiconductor or n-type semiconductor is electrically charged, any more than a regular conductor is electrically charged. The charge of the mobile current carriers in each case are balanced by the nuclear charge in the atoms.This ability to make materials that conduct electricity using both "holes" and electrons in different parts of the one piece of material allows the creation of electronic components that could never have even been imagined when the only materials known that conducted electricity used only electrons.
Yes. Gallium is used as a "dopant", a calculated impurity that turns the silicon that makes up the computer chip from a nonconductor to a semiconductor.
Arsenic is not a semiconductor by itself, but it is commonly used as a dopant in semiconductor materials like silicon to alter their electrical properties. Arsenic increases the number of available charge carriers in the material, which can make it conduct electricity more effectively.
No, indium is not a p-type semiconductor on its own. Indium is typically used as a dopant in semiconductors to tune their electrical properties, such as increasing the conductivity or modifying the bandgap.
Ion implantation is necessary in semiconductor manufacturing to precisely introduce dopant atoms into the crystal lattice of a semiconductor material, which helps modify its electrical properties. This process allows for precise control of the dopant concentration and profile, enabling the creation of specific device characteristics such as the conductivity type and doping level. Ion implantation is also used for creating shallow junctions in transistors and optimizing device performance.
The element with an atomic mass of 10.81 and starting with "B" is Boron (B). It is a metalloid with symbol B and atomic number 5. Boron is commonly used in various industrial applications and as a dopant in semiconductor materials.
A semiconductor slice is used to make integrated circuits or ICs. It is also known as a semiconductor wafer or a semiconductor substrate.
Hydrogen phosphide, also known as phosphine, is commonly used as a fumigant to control pests in stored grain and fumigation of structures. It is also used in semiconductor manufacturing, as a reducing agent in chemical reactions, and in the synthesis of organic compounds. Additionally, it has applications in the production of flame retardants, in metallurgy, and as a dopant in the electronics industry.
Electron holes in semiconductor devices play a crucial role in the flow of electrical current. When an electron moves from one atom to another in a semiconductor material, it leaves behind a hole. These holes can move through the material, allowing for the movement of charge and the creation of an electric current. By controlling the movement of electron holes, semiconductor devices can be used in a variety of electronic applications, such as transistors and diodes.
Semiconductor laser
Silicon.
it is metal.. so not used for doping.
III and V group atoms are used for doping in column IV materials. III and V relate to the number of valence electrons that are available for bonding. Silicon, which is a column IV material, is usually in a bonding form with 4 other Si atoms. In this bonding scheme, valence electrons are shared and the "outer shell" of 8 electrons is complete. In doping, an atom replaces one of the Silicon atoms. A column V atom, such as Phosphorous, can replace a Silicon atom. The bonding will be the same, except that P will provide an extra electron to the system. With thermal energy, this electron can become disassociated with its original atom, thus ionizing the dopant and creating a free electron that can be used for conduction or other processes. In p-type doping, such as using Boron in Silicon, one of the bonds is not satisfied, since Boron only has 3 valence electrons. We call this absence of an electron a "hole". In compounds such as GaAs, we have a III-V compound. In this case, you can use a column IV material for doping. So, Silicon can be used as a dopant for a III-V compound. If Si replaces a Ga atom, then Si acts like a donor. If Si replaces a As atom, Si acts like an acceptor. People in the field can use other factors, such as pressure, to preferentially select which atoms Si will replace.