No, very strong acid that can etch and dissolve glass and porcelain
HF is a strong acid.
Barium fluoride can be considered to be the salt of barium hydroxide (a weak base) and HF (a strong acid). And a solution of BaF2 will be weakly acidic.
The conjugate base of HF is the fluoride ion F-
No
Due to strong H-bonding in H20 than HF.That is why HF IS LESS VISCOUS
A strong acid. (not as strong as HCl though, because of flourine's electronegativity) it dissociates, into F- and H+ ions. and these H+ ions make it acidic.
Barium fluoride can be considered to be the salt of barium hydroxide (a weak base) and HF (a strong acid). And a solution of BaF2 will be weakly acidic.
HF is a weak acid.
The conjugate base of HF is the fluoride ion F-
HCl + NaF -> HF + NaCl
The fluoride ion, F-.
No
HSCN is not a weaker acid than HF. The Ka for HSCN is approximately 1.2x10^-1 and that for HF is approximately 7x10^-4, making HSCN considerably stronger than HF. In fact, a solution of KSCN would have a pH very slightly above 7.0, but close to neutral because it is almost a strong acid. A solution of NaF will have a pH that is basic because it is the salt of a strong base and a weak acid.
Due to strong H-bonding in H20 than HF.That is why HF IS LESS VISCOUS
A strong acid. (not as strong as HCl though, because of flourine's electronegativity) it dissociates, into F- and H+ ions. and these H+ ions make it acidic.
HCl is hydrochloric acid HI is hydroiodic acid HF is hydrofluoric acid H2SO4 is sulfuric acid HNO3 is nitric acid HBr is hydrobromic acid HClO4 is perchloric acid
A "strong" acid (or base) is one that dissociates completely in dilute aqueous solution. One which does not is a "weak" acid (or base). An acid with a pKa (or a base with a pKb) lower than about -2 is considered to be a "strong" acid.Weak acids and bases can still be quite corrosive. HF is a "weak" acid with a pKa of around 3.2 (which corresponds to only about one molecule out of every 38 or so being dissociated), but it's pretty terrible stuff and will dissolve even glass.
in hf there is present strong hydrogen bonding and hydrogen being partially positive is entrapped with two stong partailly electronegative ions.