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What is the difference between wet oxidation and dry oxidation?
Wiki User
∙ 12y ago
Silicon's surface has a high affinity for oxygen and thus an oxide layer rapidly forms upon exposure to the atmosphere. The chemical reactions which describe this formation are:
(1)
(2)
In the first reaction a dry process is utilized involving oxygen gas as the oxygen source and the second reaction describes a wet process which uses steam. The dry process provides a "good" silicon dioxide but is slow and mostly used at the beginning of processing. The wet procedure is problematic in that the purity of the water used cannot be guaranteed to a suitable degree. This problem can be easily solved using a pyrogenic technique which combines hydrogen and oxygen gases to form water vapor of very high purity. Maintaining reagents of high quality is essential to the manufacturing of integrated circuits, and is a concern which plagues each step of this process.
Wiki User
∙ 12y ago
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