HF is a very corrosive gas at room temperature. It can even etch glass!
No, hydrofluoric acid (HF) cannot be decomposed by a chemical change because it is a stable compound. Physical methods are typically used to separate HF into its constituent elements.
NH3 (ammonia) is most likely to be a gas at room temperature, while N2 (nitrogen) and H2O (water) are most likely to be liquids. Na2S (sodium sulfide) and HF (hydrogen fluoride) are solid at room temperature.
This compound is hydrogen fluoride (HF).
An HF molecule is composed of one hydrogen atom bonded to one fluorine atom. It is a colorless and odorless gas at room temperature. HF is classified as a weak acid and is commonly used in industrial processes such as etching and cleaning of metals.
No. Hf is hafnium. HF is hydrofluoric acid. Capitalization matters when writing chemical formulas.
hf
No, hydrofluoric acid (HF) cannot be decomposed by a chemical change because it is a stable compound. Physical methods are typically used to separate HF into its constituent elements.
HF
HF [note correct capitalization] is not an element but a compound, since it contains two kinds of atoms. It is a gas at standard temperature and pressure.
It is a halogen, its most common oxidation state is -1, it is a gas at room temperature (F2), It forms a weak acid (hydrofluoric acid, HF), and it has seven valence electrons.
boron
NH3 (ammonia) is most likely to be a gas at room temperature, while N2 (nitrogen) and H2O (water) are most likely to be liquids. Na2S (sodium sulfide) and HF (hydrogen fluoride) are solid at room temperature.
intermolecular forces. In the case of HF, hydrogen bonding exists between HF molecules, which results in stronger intermolecular attractions compared to the London dispersion forces present in H2 and F2. These stronger intermolecular forces in HF allow it to exist as a liquid at room temperature.
This compound is hydrogen fluoride (HF).
An HF molecule is composed of one hydrogen atom bonded to one fluorine atom. It is a colorless and odorless gas at room temperature. HF is classified as a weak acid and is commonly used in industrial processes such as etching and cleaning of metals.
HF is hydrogen fluoride.
hf is the energy of photons incident on the surface