"doping" is intentional, the addition of a small (and usually precisely measured) "impurity" ... for a reason.
"defect" just means you did something wrong.
Doping is the intentional introduction of impurities into a semiconductor material to alter its electrical properties. This process can change the conductivity of the material, allowing it to be used in the production of electronic devices such as transistors and diodes. Different types of doping, such as n-type (donor) and p-type (acceptor) doping, can create regions of positive or negative charge within the material.
The process of adding impurities to a semiconductor is called doping. It involves intentionally introducing specific atoms of different elements into the semiconductor crystal lattice to alter its electrical properties. This process can either create an excess of electrons (n-type doping) or holes (p-type doping) in the semiconductor material.
A doping essentially done for change in the properties of materials without change in their crystal structure. In an alloy the structure and properties of the developed alloy may be very different from the parent materials.
Impurities can be incorporated into a crystal structure through a process called doping, where foreign atoms are intentionally added during crystal growth. These impurities can occupy lattice sites, forming substitutional defects, or they can be present in between lattice sites, creating interstitial defects. Doping can alter the electronic and optical properties of the material, making it useful for various applications.
Doping silicon and germanium involves introducing impurities into the crystal lattice to alter their electrical conductivity. Adding donor impurities, such as phosphorus, increases the number of free electrons, making the material n-type. Adding acceptor impurities, such as boron, creates "holes", increasing the material's conductivity and making it p-type. Overall, doping changes the electrical properties of silicon and germanium, allowing them to be used in electronics.
Doping is the intentional introduction of impurities into a semiconductor material to alter its electrical properties. This process can change the conductivity of the material, allowing it to be used in the production of electronic devices such as transistors and diodes. Different types of doping, such as n-type (donor) and p-type (acceptor) doping, can create regions of positive or negative charge within the material.
Doping is a process of adding some impurity in pure material or pure semiconductor.
Its called doping.
The process of adding impurities to a semiconductor is called doping. It involves intentionally introducing specific atoms of different elements into the semiconductor crystal lattice to alter its electrical properties. This process can either create an excess of electrons (n-type doping) or holes (p-type doping) in the semiconductor material.
Its called doping.
doping profile
brrr!
A doping essentially done for change in the properties of materials without change in their crystal structure. In an alloy the structure and properties of the developed alloy may be very different from the parent materials.
Doping.
because they change a materiel's property from it original form (pure form), to a different property from due to doping fig of semiconductor distrot
Impurities can be incorporated into a crystal structure through a process called doping, where foreign atoms are intentionally added during crystal growth. These impurities can occupy lattice sites, forming substitutional defects, or they can be present in between lattice sites, creating interstitial defects. Doping can alter the electronic and optical properties of the material, making it useful for various applications.
SILICON or common sand with doping of the right ratio to make a transistor. three layers of semiconductor material