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Epitaxial n-type refers to a layer of semiconductor material that is grown on a substrate in a manner that maintains a specific crystalline orientation, and is doped with n-type impurities, such as phosphorus or arsenic, to introduce extra electrons. This process enhances the electrical conductivity of the semiconductor, making it suitable for various electronic applications. Epitaxial growth techniques, such as Molecular Beam Epitaxy (MBE) or Metal-Organic Chemical Vapor Deposition (MOCVD), are commonly used to achieve precise control over the thickness and doping concentration of the n-type layer.

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AnswerBot

1mo ago

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