When the pn junction is forward biased,the height of the potential barrier is reduced allowing more majority charge carriers ti flow across the junction and when it is reversed biased, the height of the potential barrier increases there b reducing the majority charge carrier that have sufficient energy to flow across the junction.
What is the cause of reverse recovery time in a pn junction diode
The transition capacitance of a silicon diode, often referred to as junction capacitance, depends on the applied voltage across the diode. When the diode is reverse-biased (VD < 0), the transition capacitance is positive and becomes larger as the reverse voltage increases. However, when VD = 0, the transition capacitance is at its minimum value, which can be approximated using the formula (C_j = \frac{\epsilon A}{W}), where (W) is the depletion width, (A) is the junction area, and (\epsilon) is the permittivity of the semiconductor material. At VD = 0, the depletion region is narrow, resulting in a relatively small capacitance.
Junction capacitance occurs at the depletion region of a p-n junction diode and is associated with the charge storage due to the electric field created by the built-in potential; it varies with the applied voltage. In contrast, diffusion capacitance is related to the charge carriers' movement across the junction when the diode is forward-biased, and it reflects the transient response of the charge carriers as they diffuse into the depletion region. Essentially, junction capacitance is linked to the static electric field, while diffusion capacitance is dynamic, arising from the flow of charge carriers.
It is one junction i.e. P-N junction diode.
As we bring P type and N type semiconductors fused together, then rich holes in P type would get neutralized with some rich electrons in N type. Hence at the juntion region, there will not be charge carriers ie holes and electrons. So it is known as Depletion Region. Depletion means emptying something. In case of ordinary diode this depletion region would be wider where as in case of Zener Diode the depletion region would be narrower. This is because the semiconductors are heavily doped. Hence potential barrier would be easily built up even with a thin region where holes and electrons get combined for neutrelization.
Difference between Schottky Barrier Diode and P-N Junction Diode is as following...Schottky Diode1) Usually using the aluminum metal which is trivalent element. 2) Depletion layer is thinner than the p-n junction diode.3) Forward threshold voltage is smaller than p-n junction diode(0.1V).4) The junction capacitance is lower than p-n junction diode.P-N Junction Diode1) Trivalent impurity is added to the pure silicon structure. 2) Depletion layer is wider than Schottky diode.3) Forward threshold voltage is higher than Schottky diode(0.6V)4) The junction capacitance is higher than Schottky diode.
What is the cause of reverse recovery time in a pn junction diode
they ARE, but only in close proximity (at the junction). this is what creates the depletion region around the junction: electrons being attracted to holes and falling in. once the depletion region gets wide enough attraction stops.
The transition capacitance of a silicon diode, often referred to as junction capacitance, depends on the applied voltage across the diode. When the diode is reverse-biased (VD < 0), the transition capacitance is positive and becomes larger as the reverse voltage increases. However, when VD = 0, the transition capacitance is at its minimum value, which can be approximated using the formula (C_j = \frac{\epsilon A}{W}), where (W) is the depletion width, (A) is the junction area, and (\epsilon) is the permittivity of the semiconductor material. At VD = 0, the depletion region is narrow, resulting in a relatively small capacitance.
The critical value of the voltage, at which the breakdown of a P-N junction diode occurs is called the breakdown voltage.The breakdown voltage depends on the width of the depletion region, which, in turn, depends on the doping level. The junction offers almost zero resistance at the breakdown point.
It is one junction i.e. P-N junction diode.
Junction capacitance occurs at the depletion region of a p-n junction diode and is associated with the charge storage due to the electric field created by the built-in potential; it varies with the applied voltage. In contrast, diffusion capacitance is related to the charge carriers' movement across the junction when the diode is forward-biased, and it reflects the transient response of the charge carriers as they diffuse into the depletion region. Essentially, junction capacitance is linked to the static electric field, while diffusion capacitance is dynamic, arising from the flow of charge carriers.
As we bring P type and N type semiconductors fused together, then rich holes in P type would get neutralized with some rich electrons in N type. Hence at the juntion region, there will not be charge carriers ie holes and electrons. So it is known as Depletion Region. Depletion means emptying something. In case of ordinary diode this depletion region would be wider where as in case of Zener Diode the depletion region would be narrower. This is because the semiconductors are heavily doped. Hence potential barrier would be easily built up even with a thin region where holes and electrons get combined for neutrelization.
a diode can be make using p-n junction....form a p junction n form a n junction...and after joining them u cn make a p-n junction diode....for making a diode u ll ve to face doping problems
When p-n junction of a diode reversed biased then majority carriers are not able to cross the junction and are attracted in respective regions.So current becomes approximately zero.But because of minority carriers a reverse current keeps flowing.It is called Reverse Saturation Current.And due to attraction towards sides,charges go away from junction.So width of depletion reason increases.
The diffusion capacitance in a diode is associated with the storage of minority carriers, which occurs primarily under forward bias. In reverse bias, the depletion region widens, and the majority carriers are pulled away from the junction, minimizing the injection and storage of minority carriers. As a result, the diffusion capacitance becomes negligible because there is insufficient minority carrier recombination and storage in this condition. Thus, the behavior of the diode under reverse bias is dominated by junction capacitance rather than diffusion capacitance.
Schottky Diode