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What is magnetron sputtering?

Updated: 10/18/2022
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You can watch this animation to understand the principles of sputtering and especially magnetron sputtering. The main difference between magnetron sputtering and other sputtering methods is the application of magnetic filed around the target in order to energize argon atoms for bombarding the target. Using magnetic field leads to trapping electrons in the magnetic filed created around the target which enhances plasma. This results in higher ionization of Argon atoms and bombarding rate that finally increases deposition rate. http://www.heraeus-targets.com/en/technology/_sputteringbasics/sputtering.aspx

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Q: What is magnetron sputtering?
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