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Germanium cannot be used in any integrated circuit as its oxide is crumbly and water soluble (unlike silicon's oxide which is hard and stable). The only germanium integrated circuits ever made were very low density and the interconnects between components on the chip had to be done by hand under a microscope.

There has been work done on integrated circuits using a silicon germanium alloy wafer, but this has not produced any production chips yet that I am aware of. If this can be made to work, I see no reason why this material could not be used in VLSI designs and even higher density designs.

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Q: Why germanium not used in VLSI design?
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