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Silicon is actually preferred to germanium within the manufacture of semiconductor devices due to the following reasons:

  1. Silicon is cheap and abundant
  2. In silicon, leakage current is less affected by temperature as compared to germanium.
  3. The leakage current in silicon is very very small as compared to germanium.
  4. The working temperature of silicon is more than that of germanium. The working junction temperature of silicon can go as high as 150C whereas the working junction temperature of germanium can only go as high as 60C
  5. Silicon dioxide is a stable insoluble solid that can be used both to electrically insulate circuitry and to passivate junctions preventing contamination (allowing use of inexpensive plastic packages), germanium dioxide is a crumbly water soluble solid (this requires all germanium devices to be packaged in expensive metal or glass hermetically sealed cases and making germanium integrated circuits almost impossible)
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Audra Weissnat

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3y ago

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