diffusion is high temperature process while ion implantation is low temperature process
- centrifuging - gaseous diffusion - thermal diffusion - electromagnetic separation - expansion from nozzles - laser enrichment - ion exchangers - distillation
An n-type semiconductor is formed by doping a pure semiconductor (silicon or germanium, for example) with atoms of a Group V element, typically phosphorus or arsenic. The dopant may be introduced when the crystal is formed or later, by diffusion or ion implantation.
Annealing is the heat treatment given to a semiconductor material. Annealing is the process by which the lattice damages are repaired. The damages are generally done by ion implantation on semiconductor material.
An electric current goes through an electric circuit, if it is closed.
ions that plants need for supprt and growth
Diffusion is the mixing of two materials by the natural movement of the particles.Implantation is a forced action for the introduction of an item (or partcle) in other object (material).
Ion implantation allows for precise control of dopant concentration and depth, resulting in more uniform doping profiles compared to diffusion processes. It also enables the doping of materials that are difficult to dope by diffusion. Additionally, ion implantation can be performed at lower temperatures, reducing the likelihood of damaging the material being processed.
The Diffusion Potential is the potential difference across the boundary b/w two electrolytic solutions of different compositions The Nernst Potential is the diffusion potential across a membrane that exactly opposes the net diffusion of a particular ion through the membrane
Facilitated diffusion, or diffusion through ion channels, is not a form of active transport. It is a spontaneous passive transport.
Ions are charged.
The ion biphosphate is (HPO4)2-.The ion pyrophosphate is (P2O7)4-.
gas ion transfer or diffusion through cells.
Facilitated diffusion and diffusion ion channels both involve the movement of substances down a concentration gradient without requiring energy input. However, facilitated diffusion involves the assistance of carrier proteins to transport specific molecules, while diffusion ion channels are specialized proteins that form pores in cell membranes for specific ions to pass through.
I actually don't think it does. Diffusion is normally controlled by mass, and sodium atoms being less massive than chlorine atoms should diffuse more rapidly (the difference in mass between the neutral atom and the ion isn't enough to matter).
In ion implantation, a dimer refers to two atoms that are implanted simultaneously into a target material. This can be beneficial for certain applications where the presence of two atoms together can create specific interactions or properties in the material. Dimer implantation can be used to tailor the material's properties by controlling the concentration and distribution of the two types of atoms.
positive ion forms when any electron removes from an atom and an anion called negative ion forms when an atom accepts an additional electron
Chloride is an ion of chlorine plus one electron. In solution, calcium is an ion missing two electrons.