Any Pentavalent or Trivalent atom can be added to Silicon to create an "N" type or "P" type Material respectively. Which is used to create a PN Junction. Examples of Pentavalent atoms would be arsenic, antimony, and phosphorus, these Pentavalent atoms would be used to create an "N" Type material. Examples of Trivalent atoms are aluminum, boron, and gallium. Trivalent atom would be used to create "P" type material. I don't know why you would dope germanium, unless your talking about very old technology. Germanium use has slowed to a crawl since the discovery of intrinsic (pure) silicon.
electric conductivity increases in both
It's know as 'doping'.
doping
doping
The familiar semi conducting materials are Silicon (Si) and Germanium (Ge) These belong to fourth group as they have four valence electrons. Now we need doping material whose valency may be either 5 (one more than 4) or trivalent (one less). By using one less ie trivalent material we can produce P type Si or P type Ge. Hence we add Boron, which is trivalent just as Aluminium along with Ge or Si.
electric conductivity increases in both
in silicon or germanium, the valence shell contain 4 electrons. in order to attain stability, they need 4 more electrons, so we doping it either with trivalent or pentavalent impurities. if we are doping semiconductor with any of these, we call it as an extrinsic semiconductor if we are using pentavalent impurity such as phosphorous, there will be an extra electron,which will go to conduction band. we know electron has negative charge therefore we call it as n-type semiconductor
An n-type semiconductor is formed by doping a pure semiconductor (silicon or germanium, for example) with atoms of a Group V element, typically phosphorus or arsenic. The dopant may be introduced when the crystal is formed or later, by diffusion or ion implantation.
Semi-metals, also known as metalloids, are typically made through a process called doping. This involves adding small amounts of impurities to a pure semiconductor material, such as silicon or germanium. The impurities alter the electronic properties of the material, making it exhibit characteristics of both metals and non-metals.
Doping is the process of adding impurity atoms to intrinsic silicon or germanium to improve the conductivity of the semiconductor. The term impurity is used to describe the doping elements. Two element types are used for doping: trivalent and pentavalent. A trivalent element is one that has three valence electrons A pentavalent element is one that has five valence electrons. When trivalent atoms are added to intrinsic semiconductors, the resulting material is called a p-type material. When pentavalent impurity atoms are used, the resulting material is called an n-type material. The most commonly used doping elements are listed below. Commonly Used Doping Elements Trivalent Impurities To make p-type Aluminum (Al) Gallium (Ga) Boron (B) Indium (In) Pentavalent Impurities To make n-type Phosphorus (P) Arsenic (As) Antimony (Sb) Bismuth (Bi)
It is called as DOPING. Doping is the process in which you add an impurity to a pure semiconductor to increase its conductivity. While doping is done, crystal structure of semiconductor is not disturbed.
Intrinsic - A perfect semiconductor (ex: silicon) crystal with no impurities or lattice defects is called an intrinsic semiconductorExtrinsic - an extrinsic material is achieved by introducing impurities into the intrinsic material described above, such as doping silicon with boron atoms, such that the equilibrium carrier concentrations are different from the intrinsic carrier concentration.
doping
Its called doping.
Its called doping.
It's know as 'doping'.
Very. Doping determines the conductivity, pure silicon is a good insulator.